WSI: ON-WAFER MICROWAVE MEASUREMENTS: STATE OF THE ART AND FUTURE DIRECTIONS

Date & Time: Sunday, June 12; 1:00 PM to 5:00 PM

Location: Hyatt Regency C

Topics & Speakers:  

• On-wafer VNA calibration, D. F. Williams, NIST

• Calibration comparison and applications, D. K. Walker, NIST

• On-wafer interconnect characterization, Uwe Arz, PTB

• Repeatability and reproducibility across international borders, N. Ridler, NPL, R. A. Dudley, NPL, U. Arz, PTB, D. Schubert, PTB

• Emerging on-wafer measurement techniques for MMICs, R. A. Dudley, NPL, P. Hale, NIST

• Mismatch-corrected EOS-traceable waveform measurements at NIST, D. Williams, P. Hale, T. Clement and N. Morgan, NIST

Organizers:

U. Arz, PTB          

D. Williams, NIST

R. Dudley, NPL      

Sponsors:

MTT-11: Microwave Measurements

The 65th ARFTG Conference  

An half-day workshop to address current state of the art on-wafer device characterization using electrical and optical methods from commercial and research systems. The workshop begins with a review of on-wafer Vector Network Analyser (VNA) calibration methods for two-port scattering parameter measurements, including a discussion of the merits of on- versus off-chip calibrations. Emphasis will be given to the treatment of losses in planar circuits, which necessitates an extension of scattering parameter definition derived from a general circuit theory. A quantitative method for comparing two given on-wafer calibrations will be discussed highlighting the applications of this comparison method before moving on to measurement methods suitable for characterizing the frequency-dependent behavior of planar high-speed interconnects. The final part of the workshop will report on an international on-wafer S-parameter repeatability and reproducibility exercise conducted by two national laboratories using commercial equipment. The workshop will conclude with a discussion of techniques which offer alternative methods for on-wafer measurement such as electro-optic sampling and field mapping.